A successful day at ITMA Asia 2025 in Shanghai has concluded for Graf, marking another milestone in our journey of innovation and excellence.
The exhibition provided an ideal platform to present Graf’s latest advancements in card clothing and precision solutions for the textile industry.
Visitors from around the world showed great interest in our new technologies and solutions designed to increase productivity, enhance yarn quality, and ensure sustainability in textile manufacturing. During four days, our team was passionately engaged with partners and customers to further explain the advantages and applications of Graf’s latest innovations.